Get in touch
Jipelec JetFirst Rapid Thermal Annealler (RTA)
RTA annealling up to 1200 oC at ramp rates up to 300 oC/s in nitrogen gas. The system can process wafers up to 150 mm.
Part of Organization: James Watt Building
Contact Professor Douglas Paul
Issues with this record should be reported to
If your search on our database results in an equipment or facilities collaboration we'd like to hear about it, all feedback on both successes and challenges will help us in enabling more partnerships. Click on the feedback tab.