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Jipelec JetFirst Rapid Thermal Annealler (RTA)

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RTA annealling up to 1200 oC at ramp rates up to 300 oC/s in nitrogen gas. The system can process wafers up to 150 mm.
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk