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Heidelberg Instruments μPG 101 Direct Laser Writer

Capabilities: maskless lithography with sub-micron resolution, substrates up to 125 x 125 mm², 375 nm laser source for exposure of standard and UV resists such as SU-8, vector and raster exposure mode, 3D exposure mode available.
Part of Organization: Physics

Contact Stephen Wedge +441225386956

Issues with this record should be reported to research-equipment-sharing@bath.ac.uk