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Oxford Instruments RIE80+

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An open loaded RIE tool with a 600 W rf generator, a heated stage and viewing port with interferometer to monitor the etch depth. Gases: SF6, CHF3, CF4, C2F6, N2, Ar, O2 Materials etched: SiO2, Si3N4, quartz, Si, Ge, SiGe
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk