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Oxford Instruments FlexAL Atomic Layer Deposition

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A 200 mm atomic layer deposition (ALD) tool with a plasma source and 400 oC heated stage. The tool has arrived but is being installed and the process capability being developed. The tool is load locked on a cluster tool robot with direct access to ICP PECVD and chlorine chemistry ICP RIE by vacuum transfer. Processes being developed: Al2O3, HfO2, ZrO2, TiN, TaN, WN, AlN, Pt
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk