A 200 mm atomic layer deposition (ALD) tool with a plasma source and 400 oC heated stage. The tool has arrived but is being installed and the process capability being developed. The tool is load locked on a cluster tool robot with direct access to ICP PECVD and chlorine chemistry ICP RIE by vacuum transfer.
Processes being developed: Al2O3, HfO2, ZrO2, TiN, TaN, WN, AlN, Pt
If your search on our database results in an equipment or facilities collaboration we'd like to hear about it, all feedback on both successes and challenges will help us in enabling more partnerships. Click on the feedback tab.