This is an open loaded RIE tool for etching In containing materials using methane and hydrogen gases.
Gases: CH4, H2, CHF3, C2F6, Ar, N2, O2, CF4&O2
Materials etched: III-V materials with In, InP, InGaAs, InGaAsP, AlInAs, GaN, CdTe, ZnSe, NiFe, Fe and Co
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