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ET340

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This is an open loaded RIE tool for etching In containing materials using methane and hydrogen gases. Gases: CH4, H2, CHF3, C2F6, Ar, N2, O2, CF4&O2 Materials etched: III-V materials with In, InP, InGaAs, InGaAsP, AlInAs, GaN, CdTe, ZnSe, NiFe, Fe and Co
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk