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Oxford Instruments PECVD 80+

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This is an open loaded PECVD tool configure to deposit Si3N4 at up to 300 oC. Gases: SiH4, N2O, N2, NH3, Ar, He, O2, CF4&O2
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk