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Plassys MP 900S Sputter Tool

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Interchangable targets with Ni, Pt, Al, NiCr, Au, Ge, Ti, TaN metals Suitable for samples up to 100 mm Turbo pumped load lock and main chamber 6 magnetron height adjustable cathodes each with screen and pneumatic shutter Substrate double planetary motion 3 off 1.5 kW DC and 3 off 1.0 kW rf power supplies with simultaneous operation Ar, O2 and N2 gas lines with mass flow controllers Full computer control
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk