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Hauzer HTC 1000-4/ Arc Bond Sputter coating unit

This system gives complete flexibility, allowing the tailoring of a suitable interface by the use of a HIPIMS ion etch process, whilst also giving the full benefits of unbalanced magnetron film deposition. 
Part of Organization: MERI

Contact meri@shu.ac.uk

Issues with this record should be reported to P.Harrison@shu.ac.uk