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Vistec EBPG5 HR 100 electron beam lithography tool

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Maximum substrate / wafer size of 150 mm Gaussian beam step and exposure writing strategy LaB6 filament and 20 keV, 50 keV and 100 keV operation 10 MHz pattern generator Writing field sizes of 560 x 560 µm at 100 keV and 800 x 800 µm at 50 keV Laser interferometer stage with 5 nm resolution Multi-substrate load lock
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk