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Oxford Instruments RIE100 (x2)

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These are load locked RIE tools with cooled / heated stages and viewing ports with interferometers to monitor the etch depth. Gases: SiCl4, CHF3, SF6, SiF4, C2F6, N2, Ar, O2, H2, Materials etched: III-V etching, GaAs, AlGaAs, GaN, AlGaN, high-K, low damage nitride, Au, Pt, Pd, Al, Ti
Part of Organization: James Watt Building

Contact Professor Douglas Paul Douglas.Paul@ glasgow.ac.uk

Issues with this record should be reported to Linsey.Robertson@glasgow.ac.uk