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Thermal CVD (Chemical Vapour Deposition) Facility Metritherm

Used for thermal halide CVD of gas-turbine blades and alloy substrates. Materials deposited include Al, Cr, Hf, Si, Y at temperatures of up to 1100°C. Shield gas is argon or argon-hydrogen and the process is carried out at atmospheric pressure.
Part of Organization: Cranfield Uni


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