Equipment.Data Logo

Thermal CVD (Chemical Vapour Deposition) Facility Metritherm

Used for thermal halide CVD of gas-turbine blades and alloy substrates. Materials deposited include Al, Cr, Hf, Si, Y at temperatures of up to 1100°C. Shield gas is argon or argon-hydrogen and the process is carried out at atmospheric pressure.
Part of Organization: Cranfield Uni

Contact equipment@cranfield.ac.uk

Issues with this record should be reported to equipment@cranfield.ac.uk