Bench-top turbomolecular-pumped coating system suitable for SEM, TEM and many thin film applications. Predominately used as a high resolution sputter and high vacuum carbon coater.

The system is capable of metal sputtering, with appropriate targets, some of which include: Aluminium, copper, cobalt, chromium, germanium, gold, gold/palladium, indium tin oxide (ITO), iridium, iron, manganese, molybdenum, platinum, palladium, silver, tin, tantalum, titanium and tungsten as well as carbon evaporation to produce conductive coatings and TEM replicas.

Features

• Fine grain sputtering for advanced high resolution FE-SEM applications
• High vacuum turbo pumping
• Pulsed or ramped carbon coating modes
• Enhanced sputtering of aluminium using optimised pulse cleaning
• Fully automatic touch screen control
• Ideal for SEM, high resolution FE-SEM and TEM applications
• Equipped with Gold sputter coater and Carbon coating head.
• Tilt stage assembly
• Standard and extended height chamber for tall specimens